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ULTRA 시리즈 -
나노입자 스케일의 구성물 분석을 위한 고해상도의 FE-SEM |
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The ULTRA FE-SEM is the ultimate lab tool to meet the most demanding requirements from material science, life science and semiconductor applications. The ULTRA FESEM integrates the latest developments in GEMINIŪ technology utilising a newly developed Energy selective Backscattered detector (EsBŪ).
The ULTRA features the GEMINIŪ In-lens SE detector for clear topographic imaging and the EsBŪ detector for compositional contrast imaging enabling simultaneous real time imaging and mixing of both signals. The EsBŪ detector incorporates filtering technology which enables high resolution energy selective BSE imaging at low voltages revealing previously unseen image details.
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| ULTRA PLUS |
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Combined with the optional AsBŪ (Angle selective Backscattered electron) detector for compositional and crystal orientation imaging, the ULTRA FE-SEM delivers high resolution nanostructural information along with surface topography, composition, crystal orientation and magnetic domains.
The key advantages of the ULTRA FESEM are as follows:
- Designed-in ease of use for high reliability in Multi-User laboratories
- EsBŪ detector for compositional information fully integrated
- Low kV BSE imaging at short working distance: WD = 1mm
- Ultra stable high beam current for analytical applications up to 100 nA @ 0.2%/h
- GEMINIŪ technology with high efficiency In-lens detector for high contrast topographic imaging
- No magnetic field at the specimen level
- Superb resolution and image quality at high and low operating voltages
- Extremely wide operating voltage range from 0.02-30kV
- Beam current up to 100 nA
- Sub nm resolution at 15 kV
- Local Charge Compensator in ULTRA PLUS for imaging of non conductive sample
ULTRA 시리즈 오버뷰 | |
ULTRA 시리즈 오버뷰
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Find out more about the unique & innovative electron optical system |
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