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| WLCD 32 - Wafer-level CD Metrology on photomasks |
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The novel Metrology System WLCD measures critical dimensions (CD) at wafer level and at scanner wavelength with high throughput.
- The system shortens mask qualification time significantly for both mask shops and wafer fabs.
- By utilising high resolution 193 nm optics, the tool allows actinic CD metrology based on aerial imaging technology.
- Use of scanner equivalent illumination settings captures the CD of the patterns as it is relevant for lithographic printing.
- The system measures with high precision within either die, or scribe line and also provides high CD reproducibility and throughput to the user.
- Large free working distance optics provides a through pellicle capability improving flexibility and allowing fast mask qualification.
- Actinic measurement fully considers the effect of Optical Proximity Correction (OPC) allowing OPC model verification on your mask
- Relaxes process control by actinic CD verification
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