반도체 계측장비

	제품 정보 Mask Evaluation AIMS™ 32-193i AIMS™ fab Mask Repair/ Tuning MeRiT® HR 32 CDC32 RegC® Mask Metrology PROVE™ Phame® WLCD32 Mask Processing Pellicle Removal Systems		뉴스 Carl Zeiss System PROVE™ passed Final Acceptance at NuFlare Technology Carl Zeiss launched new system RegC™ for photomask registration correction ZEISS photomask registration system PROVE™ prevails in the market AIMS™ 32-193i launched at Photomask Conference, Monterey/CA for advanced mask qualification at the 32nm node		이벤트