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| Ultra high precision mask repair for 32 nm and beyond |
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MeRiT® HR 32 is a platform especially designed for e-beam mask repair for all kind of photomasks for 32 nm node and beyond.
The novel, extremely rigid platform with external environmental
control enhances repair capability significantly. The system makes use of an acoustic and actively controlled thermal enclosure to ensure process stability. New processes with strongly increased selectivity deliver damage-free repairs.
MeRiT® HR 32 is extendible to future demands through advanced options like an Atomic Force Microscope (AFM). A dedicated EUV mask repair module will support the ramping pilot lines for EUV production.
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