Carl Zeiss SMS is pleased to present in cooperation with customers and partners results on the In-die CD Metrology System WLCD and the Critical Dimension Control System CDC.
Furthermore we invite you to discuss the latest mask repair results on new mask materials like OMOG or A2O2. Donīt miss the registration paper showing remarkable results of the novel Mask Registration System PROVE!
Please find the schedule below.
| Place & Date | Presentations |
Tuesday 14 Sep
Invited Session
8:10 - 10:10am | EMLC 2010 Best Paper: E-beam induced EUV photomask repair: a perfect
match
 Download Abstract |
Tuesday 14 Sep
Session 3: Mask Process
1:40 - 4:30pm | Process window improvement on 45-nm technology nonvolatile memory by
CD uniformity correction
Carl Zeiss SMS, Jena and Israel, Numonyx/ Italy
Download Abstract |
Wednesday 15 Sep
Poster Session
1:00 - 3:00pm | EUV-mask stack optimization for enhanced-imaging performance, ASML / Netherlands, ASML / Belgium, Carl Zeiss SMS/ Germany
Download Abstract |
Thursday 16 Sep
Session 13: Mask Repair
9:00 - 10:20am | Impact of new MoSi mask compositions on processing and repair,Carl Zeiss SMT Inc./US, MP Mask Technology / US
Download Abstract |
Thursday 16 Sep
Session 18
10:30 - 11:30am
| Improving registration metrology by correlation methods based on aliasfree aerial image simulation
Carl Zeiss SMT AG, Carl Zeiss SMS GmbH / Germany
Download Abstract |
 top |  Official Website
Conference
13-16 September, 2010
Exhibition
14-15 September, 2010
Place
Monterey Conference Center, Monterey / CA /USA, Booth No. 313
Carl Zeiss Events
Donīt miss our "Lunch & Learn Session" on Mask CDU Control Solutions
Official Invitation |