![]({"xsmall":"https://www.zeiss.co.kr/content/dam/rms/reference-master/campaigns/semiconductor/fy-23-24/istfa-2023/electronics-xrm1-1.jpg/_jcr_content/renditions/original.image_file.100.100.file/electronics-xrm1-1.jpg","small":"https://www.zeiss.co.kr/content/dam/rms/reference-master/campaigns/semiconductor/fy-23-24/istfa-2023/electronics-xrm1-1.jpg/_jcr_content/renditions/original.image_file.360.360.file/electronics-xrm1-1.jpg","medium":"https://www.zeiss.co.kr/content/dam/rms/reference-master/campaigns/semiconductor/fy-23-24/istfa-2023/electronics-xrm1-1.jpg/_jcr_content/renditions/original.image_file.768.768.file/electronics-xrm1-1.jpg","large":"https://www.zeiss.co.kr/content/dam/rms/reference-master/campaigns/semiconductor/fy-23-24/istfa-2023/electronics-xrm1-1.jpg/_jcr_content/renditions/original./electronics-xrm1-1.jpg","xlarge":"https://www.zeiss.co.kr/content/dam/rms/reference-master/campaigns/semiconductor/fy-23-24/istfa-2023/electronics-xrm1-1.jpg/_jcr_content/renditions/original./electronics-xrm1-1.jpg","xxlarge":"https://www.zeiss.co.kr/content/dam/rms/reference-master/campaigns/semiconductor/fy-23-24/istfa-2023/electronics-xrm1-1.jpg/_jcr_content/renditions/original./electronics-xrm1-1.jpg","max":"https://www.zeiss.co.kr/content/dam/rms/reference-master/campaigns/semiconductor/fy-23-24/istfa-2023/electronics-xrm1-1.jpg/_jcr_content/renditions/original./electronics-xrm1-1.jpg"} "Neuro-organoids")
WORKSHOP
제1회 한국현미경학회 엑스레이현미경 워크숍
1st KSM X-ray Microscopy Workshop
한국과학기술연구원 전북 복합소재기술연구소
곧 시작됩니다!
- 00 년
- 00 개월
- 00 일
- 00 시간
- 00 분
- 00 초
![]({"xsmall":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/2506_xrm_workshop_timetable_7.png/_jcr_content/renditions/original.image_file.100.100.18,0,415,397.file/2506_xrm_workshop_timetable_7.png","small":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/2506_xrm_workshop_timetable_7.png/_jcr_content/renditions/original.image_file.360.360.18,0,415,397.file/2506_xrm_workshop_timetable_7.png","medium":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/2506_xrm_workshop_timetable_7.png/_jcr_content/renditions/original.image_file.397.397.18,0,415,397.file/2506_xrm_workshop_timetable_7.png","large":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/2506_xrm_workshop_timetable_7.png/_jcr_content/renditions/original.image_file.397.397.18,0,415,397.file/2506_xrm_workshop_timetable_7.png","xlarge":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/2506_xrm_workshop_timetable_7.png/_jcr_content/renditions/original.image_file.397.397.18,0,415,397.file/2506_xrm_workshop_timetable_7.png","xxlarge":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/2506_xrm_workshop_timetable_7.png/_jcr_content/renditions/original.image_file.397.397.18,0,415,397.file/2506_xrm_workshop_timetable_7.png","max":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/2506_xrm_workshop_timetable_7.png/_jcr_content/renditions/original.image_file.397.397.18,0,415,397.file/2506_xrm_workshop_timetable_7.png"})
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![]({"xsmall":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/2506_xrm_workshop_timetable_9.png/_jcr_content/renditions/original.image_file.100.94.file/2506_xrm_workshop_timetable_9.png","small":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/2506_xrm_workshop_timetable_9.png/_jcr_content/renditions/original.image_file.360.338.file/2506_xrm_workshop_timetable_9.png","medium":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/2506_xrm_workshop_timetable_9.png/_jcr_content/renditions/original./2506_xrm_workshop_timetable_9.png","large":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/2506_xrm_workshop_timetable_9.png/_jcr_content/renditions/original./2506_xrm_workshop_timetable_9.png","xlarge":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/2506_xrm_workshop_timetable_9.png/_jcr_content/renditions/original./2506_xrm_workshop_timetable_9.png","xxlarge":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/2506_xrm_workshop_timetable_9.png/_jcr_content/renditions/original./2506_xrm_workshop_timetable_9.png","max":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/2506_xrm_workshop_timetable_9.png/_jcr_content/renditions/original./2506_xrm_workshop_timetable_9.png"})
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XRM 기술의 이론부터 실제까지
제1회 한국현미경학회 X-ray Microscopy 워크숍에 초대합니다.
최근 반도체, 에너지, 환경 등 다양한 분야에서 비파괴 방식의 고분해능 구조 분석에 대한 수요가 증가하고 있습니다.
나노미터 수준의 세밀한 분석이 요구되는 상황에서 X-ray Microscopy(XRM)은 성분 및 결합구조는 물론, 샘플의 3차원 형태까지 정밀하게 파악할 수 있는 핵심 기술로 주목받고 있습니다.
이번 워크숍은 한국현미경학회가 처음으로 개최하는 XRM 전문 워크숍으로, XRM의 이론적 이해와 더불어 다양한 분야에서의 최신 분석 동향 및 실습 경험까지 폭넓게 다루게 됩니다. XRM 기술에 대한 인사이트를 나누고, 전문가들과 함께 실습하며, 연구와 실무에 실질적인 도움이되는 지식 교류의 장이 되길 기대합니다.
- 일시: 2025년 6월 25일 (수) 오전 9시 - 26일 (목) 오후 6시 / 2일
- 장소: 한국과학기술연구원 전북 복합소재기술연구소 (전북 완주군 봉동읍 추동로 92 한국과학기술연구원 전북분원)
XRM의 혁신적인 기술과 국내 핵심 사용자 간의 교류의 장에서 전문가 세션과 실습부터 고급 네트워킹 디너까지 만나보세요!
ZEISS X-ray 현미경 하이라이트
아래 폼을 작성하고 워크숍에 신청하세요
최신 XRM 분석의 동향 및 분석 기법을 경험하고 학습할 수 있는 기회를 놓치지 마세요!※ 유의사항 ※
- 정원: 50명 / 선착순
* 초과 신청시 조기 접수 마감될 수 있습니다. - 등록비:
일반 - 40 만원
학생 - 30 만원 - 등록문의: 한국과학기술연구원 박승규 (sgpark8841@kist.re.kr), 황준연 (junyeon.hwang@kist.re.kr)
- 결제문의: 한국현미경학회 (office@microscopy.or.kr / 02-919-8775)