![]({"xsmall":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/korea_gemini_560-01.png/_jcr_content/renditions/original.image_file.100.100.1300,276,3334,2310.file/korea_gemini_560-01.png","small":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/korea_gemini_560-01.png/_jcr_content/renditions/original.image_file.360.360.1300,276,3334,2310.file/korea_gemini_560-01.png","medium":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/korea_gemini_560-01.png/_jcr_content/renditions/original.image_file.768.768.1300,276,3334,2310.file/korea_gemini_560-01.png","large":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/korea_gemini_560-01.png/_jcr_content/renditions/original.image_file.1024.1024.1300,276,3334,2310.file/korea_gemini_560-01.png","xlarge":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/korea_gemini_560-01.png/_jcr_content/renditions/original.image_file.1280.1280.1300,276,3334,2310.file/korea_gemini_560-01.png","xxlarge":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/korea_gemini_560-01.png/_jcr_content/renditions/original.image_file.1440.1440.1300,276,3334,2310.file/korea_gemini_560-01.png","max":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/korea_gemini_560-01.png/_jcr_content/renditions/original.image_file.1920.1920.1300,276,3334,2310.file/korea_gemini_560-01.png"})
HANDS-ON WORKSHOP
Low-kV imaging 핸즈온 워크샵
직접 경험하는 ZEISS GeminiSEM
자이스 코리아 이노베이션 센터 (동탄)
곧 시작됩니다!
- 00 년
- 00 개월
- 00 일
- 00 시간
- 00 분
- 00 초
저전압 이미징을 직접 확인하세요!
![]({"xsmall":"https://www.zeiss.co.kr/content/dam/rms/countries/singapore/apac/71.png/_jcr_content/renditions/original.image_file.100.100.180,0,900,720.file/71.png","small":"https://www.zeiss.co.kr/content/dam/rms/countries/singapore/apac/71.png/_jcr_content/renditions/original.image_file.360.360.180,0,900,720.file/71.png","medium":"https://www.zeiss.co.kr/content/dam/rms/countries/singapore/apac/71.png/_jcr_content/renditions/original.image_file.720.720.180,0,900,720.file/71.png","large":"https://www.zeiss.co.kr/content/dam/rms/countries/singapore/apac/71.png/_jcr_content/renditions/original.image_file.720.720.180,0,900,720.file/71.png","xlarge":"https://www.zeiss.co.kr/content/dam/rms/countries/singapore/apac/71.png/_jcr_content/renditions/original.image_file.720.720.180,0,900,720.file/71.png","xxlarge":"https://www.zeiss.co.kr/content/dam/rms/countries/singapore/apac/71.png/_jcr_content/renditions/original.image_file.720.720.180,0,900,720.file/71.png","max":"https://www.zeiss.co.kr/content/dam/rms/countries/singapore/apac/71.png/_jcr_content/renditions/original.image_file.720.720.180,0,900,720.file/71.png"})
True surface imaging with low kV
![]({"xsmall":"https://www.zeiss.co.kr/content/dam/rms/countries/singapore/apac/lowkv-final1.png/_jcr_content/renditions/original.image_file.100.100.180,0,900,720.file/lowkv-final1.png","small":"https://www.zeiss.co.kr/content/dam/rms/countries/singapore/apac/lowkv-final1.png/_jcr_content/renditions/original.image_file.360.360.180,0,900,720.file/lowkv-final1.png","medium":"https://www.zeiss.co.kr/content/dam/rms/countries/singapore/apac/lowkv-final1.png/_jcr_content/renditions/original.image_file.720.720.180,0,900,720.file/lowkv-final1.png","large":"https://www.zeiss.co.kr/content/dam/rms/countries/singapore/apac/lowkv-final1.png/_jcr_content/renditions/original.image_file.720.720.180,0,900,720.file/lowkv-final1.png","xlarge":"https://www.zeiss.co.kr/content/dam/rms/countries/singapore/apac/lowkv-final1.png/_jcr_content/renditions/original.image_file.720.720.180,0,900,720.file/lowkv-final1.png","xxlarge":"https://www.zeiss.co.kr/content/dam/rms/countries/singapore/apac/lowkv-final1.png/_jcr_content/renditions/original.image_file.720.720.180,0,900,720.file/lowkv-final1.png","max":"https://www.zeiss.co.kr/content/dam/rms/countries/singapore/apac/lowkv-final1.png/_jcr_content/renditions/original.image_file.720.720.180,0,900,720.file/lowkv-final1.png"})
Material contrast with EsB
![]({"xsmall":"https://www.zeiss.co.kr/content/dam/rms/countries/singapore/apac/lowkv-final4.png/_jcr_content/renditions/original.image_file.100.100.180,0,900,720.file/lowkv-final4.png","small":"https://www.zeiss.co.kr/content/dam/rms/countries/singapore/apac/lowkv-final4.png/_jcr_content/renditions/original.image_file.360.360.180,0,900,720.file/lowkv-final4.png","medium":"https://www.zeiss.co.kr/content/dam/rms/countries/singapore/apac/lowkv-final4.png/_jcr_content/renditions/original.image_file.720.720.180,0,900,720.file/lowkv-final4.png","large":"https://www.zeiss.co.kr/content/dam/rms/countries/singapore/apac/lowkv-final4.png/_jcr_content/renditions/original.image_file.720.720.180,0,900,720.file/lowkv-final4.png","xlarge":"https://www.zeiss.co.kr/content/dam/rms/countries/singapore/apac/lowkv-final4.png/_jcr_content/renditions/original.image_file.720.720.180,0,900,720.file/lowkv-final4.png","xxlarge":"https://www.zeiss.co.kr/content/dam/rms/countries/singapore/apac/lowkv-final4.png/_jcr_content/renditions/original.image_file.720.720.180,0,900,720.file/lowkv-final4.png","max":"https://www.zeiss.co.kr/content/dam/rms/countries/singapore/apac/lowkv-final4.png/_jcr_content/renditions/original.image_file.720.720.180,0,900,720.file/lowkv-final4.png"})
Logic device for voltage contrast
![]({"xsmall":"https://www.zeiss.co.kr/content/dam/rms/countries/italy/events/keyvisual_nanoinnovation_workshop.jpg/_jcr_content/renditions/original.image_file.100.100.28,0,972,944.file/keyvisual_nanoinnovation_workshop.jpg","small":"https://www.zeiss.co.kr/content/dam/rms/countries/italy/events/keyvisual_nanoinnovation_workshop.jpg/_jcr_content/renditions/original.image_file.360.360.28,0,972,944.file/keyvisual_nanoinnovation_workshop.jpg","medium":"https://www.zeiss.co.kr/content/dam/rms/countries/italy/events/keyvisual_nanoinnovation_workshop.jpg/_jcr_content/renditions/original.image_file.768.768.28,0,972,944.file/keyvisual_nanoinnovation_workshop.jpg","large":"https://www.zeiss.co.kr/content/dam/rms/countries/italy/events/keyvisual_nanoinnovation_workshop.jpg/_jcr_content/renditions/original.image_file.944.944.28,0,972,944.file/keyvisual_nanoinnovation_workshop.jpg","xlarge":"https://www.zeiss.co.kr/content/dam/rms/countries/italy/events/keyvisual_nanoinnovation_workshop.jpg/_jcr_content/renditions/original.image_file.944.944.28,0,972,944.file/keyvisual_nanoinnovation_workshop.jpg","xxlarge":"https://www.zeiss.co.kr/content/dam/rms/countries/italy/events/keyvisual_nanoinnovation_workshop.jpg/_jcr_content/renditions/original.image_file.944.944.28,0,972,944.file/keyvisual_nanoinnovation_workshop.jpg","max":"https://www.zeiss.co.kr/content/dam/rms/countries/italy/events/keyvisual_nanoinnovation_workshop.jpg/_jcr_content/renditions/original.image_file.944.944.28,0,972,944.file/keyvisual_nanoinnovation_workshop.jpg"})
Customer samples
제목
Low-kV imaging, 직접 경험하는 ZEISS GeminiSEM
동탄 자이스 코리아 이노베이션 센터에서 진행되는 핸즈온 워크샵에 지금 바로 신청하세요!
ZEISS에서 준비한 샘플부터 여러분의 샘플까지 저전압 이미징을 직접 확인하세요!
- 10 mins | Intro
- 20 mins | True surface imaging with low kV
- 15 mins | Material contrast with EsB
- 15 mins | Logic device for voltage contrast
- 15 mins | Break
- 45 mins | Customer samples
* 모든 일정의 세션은 상기 동일한 컨텐츠로 진행됩니다.
* 세션당 정원 인원이 초과될 경우, 선착순으로 다른 세션으로 조정될 수 있음을 알려드립니다.
#1 Morning Session
(마감) #2 Mid Afternoon Session
#3 Late Afternoon Session
![]({"xsmall":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/kroea_yuna.png/_jcr_content/renditions/original.image_file.100.100.5,0,1019,1014.file/kroea_yuna.png","small":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/kroea_yuna.png/_jcr_content/renditions/original.image_file.360.360.5,0,1019,1014.file/kroea_yuna.png","medium":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/kroea_yuna.png/_jcr_content/renditions/original.image_file.768.768.5,0,1019,1014.file/kroea_yuna.png","large":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/kroea_yuna.png/_jcr_content/renditions/original.image_file.1014.1014.5,0,1019,1014.file/kroea_yuna.png","xlarge":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/kroea_yuna.png/_jcr_content/renditions/original.image_file.1014.1014.5,0,1019,1014.file/kroea_yuna.png","xxlarge":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/kroea_yuna.png/_jcr_content/renditions/original.image_file.1014.1014.5,0,1019,1014.file/kroea_yuna.png","max":"https://www.zeiss.co.kr/content/dam/rms/countries/south-korea/kroea_yuna.png/_jcr_content/renditions/original.image_file.1014.1014.5,0,1019,1014.file/kroea_yuna.png"})
발표자
YuNa, Lee
ZEISS Korea 현미경 솔루션 사업부
Product Application Sales Specialist